TITLE

IMEC's Ronse: Albany-IMEC joint EUV work not giving up on 32nm-hp, yet

AUTHOR(S)
Montgomery, James
PUB. DATE
February 2008
SOURCE
Microlithography World;Feb2008, Vol. 17 Issue 1, p16
SOURCE TYPE
Trade Publication
DOC. TYPE
Interview
ABSTRACT
An interview with Kurt Ronse, lithography program director at IMEC, is presented. Ronse discusses the partnership between IMEC and the University of Albany's College of Nanoscale Science and Engineering to accelerate the development of extreme ultraviolet (EUV) lithography technology. He explained that their collaboration makes the most of the work needed with limited resources. He says that the results of their EUV efforts will be shared by each group's program participants.
ACCESSION #
30055110

 

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