IMEC's Ronse: Albany-IMEC joint EUV work not giving up on 32nm-hp, yet

Montgomery, James
February 2008
Microlithography World;Feb2008, Vol. 17 Issue 1, p16
Trade Publication
An interview with Kurt Ronse, lithography program director at IMEC, is presented. Ronse discusses the partnership between IMEC and the University of Albany's College of Nanoscale Science and Engineering to accelerate the development of extreme ultraviolet (EUV) lithography technology. He explained that their collaboration makes the most of the work needed with limited resources. He says that the results of their EUV efforts will be shared by each group's program participants.


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