TITLE

There really is a litho wall

AUTHOR(S)
Levenson, M. David
PUB. DATE
August 2006
SOURCE
Microlithography World;Aug2006, Vol. 15 Issue 3, p20
SOURCE TYPE
Trade Publication
DOC. TYPE
Editorial
ABSTRACT
The article offers observations on the developments in optical lithography. The author cites the optical innovations that seemed to take us to 100nm resolution. He says that at the 32nm node and beyond, some paradigms are needed to be changed. He cites extreme-utraviolet as the consensus option for chips made in large quantities for generations beyond 32nm.
ACCESSION #
22079952

 

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