There really is a litho wall

Levenson, M. David
August 2006
Microlithography World;Aug2006, Vol. 15 Issue 3, p20
Trade Publication
The article offers observations on the developments in optical lithography. The author cites the optical innovations that seemed to take us to 100nm resolution. He says that at the 32nm node and beyond, some paradigms are needed to be changed. He cites extreme-utraviolet as the consensus option for chips made in large quantities for generations beyond 32nm.


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