Getting small at SPIE Microlithography

Levenson, M. David
May 2005
Microlithography World;May2005, Vol. 14 Issue 2, p20
Trade Publication
Comments on the innovations presented at the SPIE International Symposium on Microlithography in Silicon Valley, California in 2005. Creation of microprocessors using liquid immersion lithography; Absence of extreme ultraviolet lithography in the innovations; Reason for the success and failure of some innovations.


Related Articles

  • Laser-focused atom beam promises smaller semicondu  // Laser Focus World;Oct95, Vol. 31 Issue 10, p9 

    Reports on Cambridge, Massachusetts-based Harvard University Department of Physics researchers' description of a new microlithographic technique. Technique's use of a beam of neutral inert gas atoms in metastable excited states; Description of the process.

  • SHOWS & CONFERENCES.  // Microlithography World;Nov2005, Vol. 14 Issue 4, p19 

    Presents a schedule of conferences related to microlithography to be held from December 2005 to February 2006. Semicon Japan exhibition in Tokyo, Japan; 22nd European Mask & Lithography Conference in Dresden, Germany; International Symposium on Microlithography in San Jose, California.

  • Taking chip-making into the next millennium. Dougherty, Patrick // Laser Focus World;Jan99, Vol. 35 Issue 1, p77 

    Focuses on the SPIE's Microlithography Symposium on March 14-19, 1999 at Santa Clara Convention Center in Santa Clara, California. Topics to be covered and discussed.

  • 193-nm development hampered by contamination. Levenson, M. David // Solid State Technology;May98, Vol. 41 Issue 5, p32 

    Focuses on 193-nm technology discussed during the SPIE Microlithography Symposium in Santa Clara, California. Issue of subsequent contamination of optical element; Issue on calcium fluoride optical material.

  • Microlithographic challenges for flat panel display... Sumner, Roger C. // Solid State Technology;Jan96, Vol. 39 Issue 1, p103 

    Reviews performance requirements on microlithography equipment in the production of flat panel displays. Discussion of active matrix liquid crystal displays; Emergence of field emission display technologies.

  • SHOWS & CONFERENCES.  // Microlithography World;May2006, Vol. 15 Issue 2, p23 

    Presents a calendar of events related to microlithography in the U.S. in 2006. International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication; SEMICON West exhibition and conference; 26th Annual BACUS Symposium on Photomask Technology.

  • Tech2006 speakers to stress innovation. Tampone, Kevin // Business Journal (Central New York);4/28/2006, Vol. 20 Issue 17, p13 

    The article offers information on the Tech2006 manufacturing and technology conference organized by CASE Center and Central New York Technology Development Organization and will be held at the Holiday Inn Convention Center in Liverpool, New York on May 8, 2006.

  • CONFERENCE: BRANDPACKAGING'S PACKAGING THAT SELLS IV.  // National Provisioner;Aug2006 Supplement, Vol. 220, p13 

    Information about several conferences related to the new packaging technologies are presented.

  • Reinventing the chain convention. Watkins, Ed // Lodging Hospitality;Oct93, Vol. 49 Issue 11, p2 

    Opinion. Calls for the redirection of expensive and large annual lodging chain gatherings into low key and better focused conventions. Cost of hiring high profile speakers; Difficulty of holding business discussions in a large convention; Cost saving alternatives.


Other Topics