TITLE

Getting small at SPIE Microlithography

AUTHOR(S)
Levenson, M. David
PUB. DATE
May 2005
SOURCE
Microlithography World;May2005, Vol. 14 Issue 2, p20
SOURCE TYPE
Trade Publication
DOC. TYPE
Editorial
ABSTRACT
Comments on the innovations presented at the SPIE International Symposium on Microlithography in Silicon Valley, California in 2005. Creation of microprocessors using liquid immersion lithography; Absence of extreme ultraviolet lithography in the innovations; Reason for the success and failure of some innovations.
ACCESSION #
16990920

 

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