TITLE

An idea emerges

AUTHOR(S)
Levenson, M. David
PUB. DATE
May 2004
SOURCE
Microlithography World;May2004, Vol. 13 Issue 2, p28
SOURCE TYPE
Trade Publication
DOC. TYPE
Editorial
ABSTRACT
Comments on the development of 193 nanometer immersion lithography. Information on Burn Lin, senior director of micropatterning at TSMC; Communication of persons involved in the semiconductor industry.
ACCESSION #
13136707

 

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