Immersion and polarization

Levenson, M. David
August 2003
Microlithography World;Aug2003, Vol. 12 Issue 3, p20
Trade Publication
Editorial. Discusses the need to control polarization to maximize the potential of immersion lithography. Background on the function of photoresists in semiconductor manufacturing; Role of resist-surface reaction in liquid immersion lithography; Concerns over the effect of incompatible technologies on optical lithography.


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