Advanced photomask repair and verification

Scherübl, Thomas; Ehrlich, Christian; Böhm, Klaus; Ramstein, Marcus
May 2007
Microlithography World;May2007, Vol. 16 Issue 2, p15
Trade Publication
Case Study
The article describes the MeRiT electronic beam mask repair tool from Zeiss Semiconductor Metrology Systems (SMS) for use in repairing attenuated phase-shifting masks with 45nm features. The masks have been analyzed for immersion scanners using the aerial image metrology (AIM) 45-193i which is jointly developed by Zeiss SMS and SEMATECH. The principle and features of the mask repair tool are provided.


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