TITLE

Advanced photomask repair and verification

AUTHOR(S)
Scherübl, Thomas; Ehrlich, Christian; Böhm, Klaus; Ramstein, Marcus
PUB. DATE
May 2007
SOURCE
Microlithography World;May2007, Vol. 16 Issue 2, p15
SOURCE TYPE
Trade Publication
DOC. TYPE
Case Study
ABSTRACT
The article describes the MeRiT electronic beam mask repair tool from Zeiss Semiconductor Metrology Systems (SMS) for use in repairing attenuated phase-shifting masks with 45nm features. The masks have been analyzed for immersion scanners using the aerial image metrology (AIM) 45-193i which is jointly developed by Zeiss SMS and SEMATECH. The principle and features of the mask repair tool are provided.
ACCESSION #
25237115

 

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