TITLE

Resolution enhancement technologies

AUTHOR(S)
Mack, Chris A.
PUB. DATE
May 2003
SOURCE
Microlithography World;May2003, Vol. 12 Issue 2, p14
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Discusses resolution enhancement technologies (RET) used in optical lithography. Overview of alternating phase shift masks (PSM); Cost of application of RET; Application of off-axis illumination to mimic the two-beam imaging found in PSM.
ACCESSION #
9926164

 

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