TITLE

The real cost of RETs

AUTHOR(S)
Mason, Mark E.
PUB. DATE
May 2003
SOURCE
Microlithography World;May2003, Vol. 12 Issue 2, p8
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Focuses on the use of the International Sematech cost of ownership analysis to estimate the impact of resolution enhancement technologies (RET) on overall lithography cost of ownership. Impact of the well-known mask data flow problems; Phenomenon regarding the increasing complexity of lithography; Reason for different RET requirements at different wafer fabs.
ACCESSION #
9926162

 

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