Immersion lithography: Beyond the 65mm node with optics

Switkes, M.; Rothschild, M.; Kunz, R.R.; Baek, S-Y.; Cole, D.; Yeung, M.
May 2003
Microlithography World;May2003, Vol. 12 Issue 2, p4
Trade Publication
Examines the use of liquid immersion lithography to enhance optical microscopy. Use of Rayleigh equation to determine the resolution of an optical system; Numerical simulations of the depth of focus expected for binary mask; Problems of immersion which include the identification of suitable high index.


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