TITLE

Immersion lithography: Beyond the 65mm node with optics

AUTHOR(S)
Switkes, M.; Rothschild, M.; Kunz, R.R.; Baek, S-Y.; Cole, D.; Yeung, M.
PUB. DATE
May 2003
SOURCE
Microlithography World;May2003, Vol. 12 Issue 2, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Examines the use of liquid immersion lithography to enhance optical microscopy. Use of Rayleigh equation to determine the resolution of an optical system; Numerical simulations of the depth of focus expected for binary mask; Problems of immersion which include the identification of suitable high index.
ACCESSION #
9926161

 

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