Fast anisotropic etching of silicon in an inductively coupled plasma reactor

Perry, A. J.; Boswell, R. W.
July 1989
Applied Physics Letters;7/10/1989, Vol. 55 Issue 2, p148
Academic Journal
A 13.56 MHz rf inductively coupled diffusion plasma confined by a weak magnetic field is shown to produce high etch rates and high plasma densities. With a substrate bias of -160 V and 1 mTorr of pure SF6, silicon has been etched anisotropically at a rate of 0.7 μm min-1 with a selectivity to SiO2 of about 5.


Related Articles

  • A generalized plasma etching model with an oblique magnetic field. Zawaideh, Emad; Kim, N. S. // Journal of Applied Physics;8/1/1989, Vol. 66 Issue 3, p1113 

    Presents a study which developed a generalized plasma etching model with an oblique magnetic field. Generalized plasma etching equations; Results and discussion; Conclusion.

  • The resistive tearing mode in a weakly two-dimensional sheet pinch. Paris, R. B. // Physics of Fluids (00319171);Jan87, Vol. 30 Issue 1, p102 

    The influence of a weak normal component of the magnetic field B[sub n] on the resistive tearing mode in a sheet pinch is examined. The dispersion relation in the high conductivity limit is derived in closed analytical form and it is shown that the normal magnetic field exerts a stabilizing...

  • Generalized plasma dispersion function for a plasma with a kappa-Maxwellian velocity distribution. Hellberg, M. A.; Mace, R. L. // Physics of Plasmas;May2002, Vol. 9 Issue 5, p1495 

    A generalized plasma dispersion function has previously been obtained for waves in plasmas with isotropic kappa distributions for arbitrary real kappa [Mace and Hellberg, Phys. Plasmas 2, 2098 (1995)]. In many instances plasmas are found to have anisotropic power-law distributions, and hence a...

  • Channeling and diffusion in dry-etch damage. Rahman, M. // Journal of Applied Physics;9/1/1997, Vol. 82 Issue 5, p2215 

    Presents analytic expressions incorporating channeling and diffusion in dry-etch damage. Modification of the final defect distribution; Quantitative characterization of damage and assessment of new etch processes; Deflect creation rate; Plasma discharges; Ion mass and sheat thickness.

  • Oxygen-free dry etching of α-SiC using dilute SF[sub 6]:Ar in an asymmetric parallel plate 13.56 MHz discharge. Scofield, J. D.; Bletzinger, P.; Ganguly, B. N. // Applied Physics Letters;7/6/1998, Vol. 73 Issue 1 

    Etch rates of up to 2200 Ã…/min have been achieved on hexagonal silicon carbide (SiC) using dilute mixtures of SF[sub 6]:Ar in a standard 13.56 MHz asymmetric parallel plate discharge. Furthermore, these etch rates have been realized with excellent pattern anisotropy profiles of approximately...

  • Numerical study of the etch anisotropy in low-pressure, high-density plasma etching. Tuda, Mutumi; Nishikawa, Kazuyasu // Journal of Applied Physics;1/15/1997, Vol. 81 Issue 2, p960 

    Investigates the evolution of etched anisotropy during low-pressure, high-density (LPHD) plasma etching of silicon in dichloride (Si in Cl2) using a numerical method. Calculation of surface etch rates using a reaction model of synergism between incoming ions and neutral reactants; Spread of ion...

  • Weibel instability in a plasma with nonzero external magnetic field. Pokhotelov, O. A.; Balikhin, M. A. // Annales Geophysicae (09927689);Jul2012, Vol. 30 Issue 7, p1051 

    The theory of the Weibel instability is generalized for the case of a plasma immersed in a nonzero external magnetic field. It is shown that the presence of this external field modifies the dispersion relation for this mode which now possesses a nonzero frequency. The explicit expression for the...

  • Linear Theory of Temperature Anisotropy Instabilities in Magnetized Thermal Pair Plasmas. Schlickeiser, Reinhard // Open Plasma Physics Journal;2010, Vol. 3, p1 

    A rigorous study of the dispersion relations of weakly amplified and weakly propagating transverse fluctuations with wave vectors ( →k ∥ →B ) parallel to the uniform background magnetic field →B in an anisotropic bi-Maxwellian magnetized pair plasma is presented....

  • Tokamak edge plasma simulation including anomalous cross-field convective transport. Pigarov, A. Yu.; Krasheninnikov, S. I.; Rognlien, T. D.; Schaffer, M. J.; West, W. P. // Physics of Plasmas;Apr2002, Vol. 9 Issue 4, p1287 

    Multi-fluid two-dimensional transport models such as the UEDGE code model [T. D. Rognlien et al., J. Nucl. Mater. 196-198, 34 (1992)] are widely used in the simulation of tokamak edge plasmas. Usually these models are based on the assumption of anomalous plasma diffusion in the direction...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics