Metalorganic chemical vapor deposition of [100] textured MgO thin films

Kwak, B. S.; Boyd, E. P.; Zhang, K.; Erbil, A.; Wilkins, B.
June 1989
Applied Physics Letters;6/19/1989, Vol. 54 Issue 25, p2542
Academic Journal
We report on the results of a recent study on the deposition of [100] textured MgO films on fused quartz substrates by using the metalorganic chemical vapor deposition technique. Magnesium β-diketonate was used as the metal source and the growth rate of the film was about 0.4 μm/h at 740 °C in a horizontal warm wall reactor. X-ray diffraction experiments provided evidence that the MgO films on fused quartz were fully textured with [100] orientation perpendicular to the substrate surface. The films had a very smooth surface morphology and optical transparency with an index of refraction of 1.71.


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