Scaling of an injection-controlled XeF(C→A) laser pumped by a repetitively pulsed, high current density electron beam

Hirst, G. J.; Dane, C. B.; Wilson, W. L.; Sauerbrey, R.; Tittel, F. K.; Nighan, W. L.
May 1989
Applied Physics Letters;5/8/1989, Vol. 54 Issue 19, p1851
Academic Journal
This letter reports the design and performance of a scaled, injection-controlled XeF(C→A) laser pumped by a repetitively pulsed, high current density electron beam with a temporal duration of 10 ns full width at half maximum. Injection of a 2 mJ pulse at 486.8 nm having a spectral width of <0.005 nm resulted in an amplified output of 0.7 J corresponding to energy density and efficiency values of 1.5 J/l and 1.2%.


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