Changes in composition and deposition rates in the reactive sputtering of copper, titanium, and yttrium exposed to oxygen

Ohwaki, Takeshi; Taga, Yasunori
April 1989
Applied Physics Letters;4/24/1989, Vol. 54 Issue 17, p1664
Academic Journal
Copper, titanium, and yttrium oxide films were prepared by reactive dc magnetron sputtering in an Ar-O2 plasma and the deposition rates and compositional changes were measured as a function of dc power. The deposition rates of Cu increased monotonically with increasing dc power, while those of Ti and Y increased abruptly by more than one order of magnitude at a critical dc power (Pc). Abrupt compositional changes of metal and oxygen in the thin films were also observed for Ti and Y at Pc. The compositional change curve for Cu had a plateau in dc power dependence. These results correlate with the differences of heat of oxide formation among Cu, Ti, and Y.


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