In situ formation of YBa2Cu3Ox thin films by physical sputtering

Yeh, J.-J.; Hong, M.; Felder, R. J.
March 1989
Applied Physics Letters;3/20/1989, Vol. 54 Issue 12, p1163
Academic Journal
We have found that in situ superconducting Y-Ba-Cu-O thin films can be produced by sputtering without the aid of any external O2 source during deposition. The films were produced by rf magnetron sputtering from a composite target onto MgO(100) substrates heated at 650 °C. Films made in a pure Ar pressure of 24 mTorr and fast cooled in N2 ambient contain the tetragonal YBa2Cu3Ox phase with x estimated to be 6.1. Films made under the same sputtering conditions but cooled in 30 mTorr oxygen after deposition, show a superconducting transition Tc(R=0) at 71 K with an onset at 85 K. The Tc(R=0) rises to 80 K if 0.5 mTorr oxygen was added during sputtering. The experimental results provide conclusive evidence that sufficient oxygen can be incorporated into the films to form the tetragonal YBa2Cu3Ox phase simply by physical sputtering from an oxide target. The films absorb additional oxygen and transform into the orthogonal, superconducting phase when subsequently cooled in partial O2.


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