Effects of annealing on TlBaCaCuO thin films

Denhoff, M. W.; Grant, P.; Qiu, C. X.; Shih, I.; Robinson, P. T.; Sproule, I.; Mitchell, D.
February 1989
Applied Physics Letters;2/13/1989, Vol. 54 Issue 7, p660
Academic Journal
We have studied the effects of high-temperature anneals on sequentially deposited TlBaCaCu films in an environment containing O2 and TlOx . From Auger electron spectroscopy depth profiles, it was found that Tl was quite volatile and can be easily eliminated from the thin films after a short treatment at 830 °C. However, the Tl can be incorporated in the films after appropriate treatment.


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