Measurement of opaque coating thickness using photothermal radiometry

Sheard, S. J.; Somekh, M. G.
December 1988
Applied Physics Letters;12/26/1988, Vol. 53 Issue 26, p2715
Academic Journal
We describe a method for determination of film thickness using the photothermal radiometric microscope. The method is noncontacting and nondestructive, and is applicable to coatings covering the entire surface of the material. The frequency variation of both the amplitude and phase of the thermal wave response is used to determine the film thickness. This gives two independent measures. The technique is valid regardless of the properties of the substrate material, but is more accurate when these differ substantially from those of the coating.


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