High Tc Y-Ba-Cu-O thin films by ion beam sputtering

Gao, J.; Zhang, Y. Z.; Zhao, B. R.; Out, P.; Yuan, C. W.; Li, L.
December 1988
Applied Physics Letters;12/26/1988, Vol. 53 Issue 26, p2675
Academic Journal
High quality Y-Ba-Cu-O thin films were successfully prepared by using ion beam sputtering. Zero resistance was reached at 90 K. The critical current density at 77 K was 4–5×104 A/cm2. The surface morphology of the films was observed by scanning electron microscopy.


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