Pulsed-ultraviolet laser Raman diagnostics of plasma processing discharges

Hargis, P. J.; Greenberg, K. E.
November 1988
Applied Physics Letters;11/7/1988, Vol. 53 Issue 19, p1809
Academic Journal
Spontaneous Raman spectroscopy with pulsed-ultraviolet laser excitation of the Stokes vibrational Raman lines was used to measure the percent dissociation of nitrogen and sulfur hexafluoride in low-pressure radio refrequency discharges of the type used for processing semiconductor materials. Measurements of the percent dissociation of sulfur hexafluoride, at pressures between 200 and 600 mTorr, show a strong pressure dependence which is consistent with recombination playing an important role in sulfur hexafluoride discharge kinetics.


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