TITLE

Selective deposition of diamond crystals by chemical vapor deposition using a tungsten-filament method

AUTHOR(S)
Hirabayashi, K.; Taniguchi, Y.; Takamatsu, O.; Ikeda, T.; Ikoma, K.; Iwasaki-Kurihara, N.
PUB. DATE
November 1988
SOURCE
Applied Physics Letters;11/7/1988, Vol. 53 Issue 19, p1815
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Selective deposition of polycrystalline and single-crystal diamonds has been achieved on a silicon wafer by chemical vapor deposition from CH4 and H2 gases using a hot-filament method. The nucleation of diamonds occurs selectively at the sites fabricated by successive roughening and patterned etching of wafers.
ACCESSION #
9828722

 

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