Plasma x-ray source for lithography generated by a ≊30 J, 30 ns KrF laser

Davis, G. M.; Gower, M. C.; O’Neill, F.; Turcu, I. C. E.
October 1988
Applied Physics Letters;10/24/1988, Vol. 53 Issue 17, p1583
Academic Journal
A plasma x-ray source for lithography is generated by focusing ≊30 J, 30 ns KrF laser pulses onto Cu targets at irradiances up to 2×1014 W/cm2. Energy conversion efficiency from 249 nm laser light to x rays at 1.0 keV≤hν≤1.4 keV is measured as a function of target irradiance and the maximum efficiency is ≊2.5%. The full width half-maximum duration of the plasma x-ray pulse is ≊5 ns which corresponds to a peak power x-ray conversion efficiency ≊7.5%.


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