Plasma x-ray source for lithography generated by a ≊30 J, 30 ns KrF laser

Davis, G. M.; Gower, M. C.; O’Neill, F.; Turcu, I. C. E.
October 1988
Applied Physics Letters;10/24/1988, Vol. 53 Issue 17, p1583
Academic Journal
A plasma x-ray source for lithography is generated by focusing ≊30 J, 30 ns KrF laser pulses onto Cu targets at irradiances up to 2×1014 W/cm2. Energy conversion efficiency from 249 nm laser light to x rays at 1.0 keV≤hν≤1.4 keV is measured as a function of target irradiance and the maximum efficiency is ≊2.5%. The full width half-maximum duration of the plasma x-ray pulse is ≊5 ns which corresponds to a peak power x-ray conversion efficiency ≊7.5%.


Related Articles

  • 1 W plasma x-ray source for lithography at nm wavelength. Turcu, I.C.E.; Ross, I.N. // Review of Scientific Instruments;Sep96, Vol. 67 Issue 9, p3245 

    Reports on the use of a picosecond excimer laser-plasma source to generate average x-ray powers of 1.5 and 0.9 W at 1.4 and 1 nm wavelength. Requirement of the wavelengths for proximity x-ray lithography; Laser system's use of a commercial JrF excimer amplifier; Laser to x-ray energy...

  • Overview of LIGA Microfabrication. Hruby, Jill // AIP Conference Proceedings;2002, Vol. 625 Issue 1, p55 

    This paper is an overview of the LIGA technique, an increasingly accepted approach for fabricating metal, ceramic or plastic microdevices. The LIGA technique was invented in Germany in the early 1980s and the acronym derives from the words LIthographie, Galvanoformung, Abformung meaning...

  • High resolution imaging and lithography with hard x rays using parabolic compound refractive lenses. Schroer, C. G.; Benner, B.; Gu¨nzler, T. F.; Kuhlmann, M.; Zimprich, C.; Lengeler, B.; Rau, C.; Weitkamp, T.; Snigirev, A.; Snigireva, I.; Appenzeller, J. // Review of Scientific Instruments;Mar2002, Vol. 73 Issue 3, p1640 

    Parabolic compound refractive lenses are high quality optical components for hard x rays. They are particularly suited for full field imaging, with applications in microscopy and x-ray lithography. Taking advantage of the large penetration depth of hard x rays, the interior of opaque samples can...

  • Automated micromachining at the NSLS. Ramotowski, Michelle; Johnson, Erik // AIP Conference Proceedings;2000, Vol. 521 Issue 1, p147 

    X14B, the newest beamline at the NSLS, saw its first light early this summer. Designed solely for deep x-ray lithography (DXRL), it is intended for processing large quantities of deep (up to a few mm), but essentially 2D in design, parts. It has an effective scan area of 637 cm2, and a hydraulic...

  • Experimental and Theoretical Simulations for Conditions for Lasing at 13.5 nm in LiIII. Avitzour, Y.; Geltner, I.; Morozov, A.; Ping, Y.; Suckewer, S. // AIP Conference Proceedings;2002, Vol. 641 Issue 1, p212 

    We present results related to the search for optimum conditions for lasing to ground state of H-like LiIII ions at 13.5 nm. These conditions are being considered from the point of view of the development of a prototype of a very compact 13.5 nm laser for metrology of soft x-ray (EUV)...

  • Toward high resolution and high efficiency Zone Plate for X-ray applications. Di Fabrizio, Enzo; Romanato, Filippo; Gentili, Massimo // AIP Conference Proceedings;2000, Vol. 507 Issue 1, p635 

    High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution issue gold zone plate with 70 nm resolution and thickness of 0.4 μm are shown. When the...

  • Use of photosensitive polyimide for deep x-ray lithography. White, V.; Ghodssi, R. // Applied Physics Letters;4/17/1995, Vol. 66 Issue 16, p2072 

    Investigates the use photosensitive polyimide (PPI) in deep x-ray lithography. Characteristics of PPI; Sensitivity of PPI to x-rays; Use of PPI in micromachining technique; Resolution of PPI upon x-ray exposure.

  • Move over, Superman, I've got X-ray vision too. Rothstein, Linda // Bulletin of the Atomic Scientists;Jul/Aug2001, Vol. 57 Issue 4, p8 

    Presents information on some X-ray vision items recommended to law enforcement groups. Sub-surface radar developed by Australian scientists; Pistol-handled radar flashlight developed by researchers at the Georgia Institute of Technology; See-Through product offered by Mistral Security.

  • IBM, Motorola, Japan firms agree on common mask for x-ray lithography. Lunday, Christine // Solid State Technology;May97, Vol. 40 Issue 5, p48 

    Reports on an agreement among International Business Machines Corp., Motorola Inc. and four Japanese firms to use silicon carbide and tantalum as mask membranes and absorber materials for x-ray lithography. Characteristics of tantalum; Study on the costs of x-ray lithography.


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics