Modulated optical reflectance: A method for characterizing polycrystalline silicon

Alpern, P.; Kakoschke, R.; Schöninger, M.; Wurm, S.
August 1988
Applied Physics Letters;8/15/1988, Vol. 53 Issue 7, p577
Academic Journal
We describe modulated optical reflectance experiments with polycrystalline silicon layers treated by rapid optical annealing. The layers were deposited on SiO2 or on crystalline Si. It turns out that the modulated optical reflectance signals are very sensitive to small variations of the grain size in the first case and to epitaxial realignment in the second one.


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