Use of electron beam lithography to selectively decompose metalorganics into patterned thin-film superconductors

Mantese, J. V.; Catalan, A. B.; Hamdi, A. H.; Micheli, A. L.; Studer-Rabeler, K.
August 1988
Applied Physics Letters;8/8/1988, Vol. 53 Issue 6, p526
Academic Journal
Fine line superconductors, approximately 5 μm in width and 260 nm thick, were formed from Y-Ba-Cu on <100>SrTiO3 by the combined methods of metalorganic deposition and selective area electron beam exposure. The lines were written in metal neodecanoates using an electron beam having a spot size of 0.25 μm and an energy of 25 kV. The dosage of the exposure was 1200 μC/cm2. Unexposed areas were removed with a 30 s xylene wash. A 500 °C pyrolysis in air for 300 s followed by rapid thermal annealing in oxygen produced lines having superconducting onsets above 90 K and zero resistance at 69 K.


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