Ionic species responsible for the plasma anodization of silicon

Barlow, K. J.; Kiermasz, A.; Eccleston, W.; Moruzzi, J. L.
July 1988
Applied Physics Letters;7/4/1988, Vol. 53 Issue 1, p57
Academic Journal
Identification of the species that promotes the growth of silicon dioxide on silicon in a microwave oxygen plasma has been investigated. Comparison of ion analysis experiments using quadropole mass spectrometry and oxide growth experiments performed in the same system indicates a strong correlation between the oxide growth and the presence of O- ions in the plasma.


Related Articles

  • Kinetics of the silicon dioxide growth process in afterglows of microwave-induced plasmas. Vinckier, C.; Coeckelberghs, P.; Stevens, G.; Heyns, M.; De Jaegere, S. // Journal of Applied Physics;8/15/1987, Vol. 62 Issue 4, p1450 

    Investigates the kinetics of the silicon dioxide growth process in afterglows of microwave-induced plasmas. Information on the technological application of silicon dioxide layers; List of alternative thermal oxidation techniques; Advantages of the flowing afterglow technique in thermal oxidation.

  • Asymmetric microtrenching during inductively coupled plasma oxide etching in the presence of a weak magnetic field. Schaepkens, Marc; Oehrlein, Gottlieb S. // Applied Physics Letters;3/16/1998, Vol. 72 Issue 11 

    When fabricating microscopic features in SiO[sub 2] layers using low pressure, high-density fluorocarbon plasmas, microtrenching has commonly been observed. Microtrenching has been explained either as due to ion scattering from sloped sidewalls or negative charging of the sidewalls by electrons,...

  • High power microwave line with arbitrary impedance matching capability for plasma applications. Ganguli, A.; Baskaran, R.; Naidu, P. A.; Raju, G. V. R. // Review of Scientific Instruments;Feb1989, Vol. 60 Issue 2, p244 

    The details of a high power microwave transmission line developed for plasma applications are presented. The line operates at 2.45 GHz and can handle about <=1 kW of cw microwave power with about 15%–20% insertion loss. A special feature of the line is its wide range impedance matching...

  • Prominent characteristics of the decay of a photoplasma generated by radiation from an annular sliding discharge. Popov, N. A. // Technical Physics;Jul98, Vol. 43 Issue 7, p790 

    The dynamics of the absorption of diagnostic microwave radiation in a decaying nitrogen photoplasma generated by a pulsed annular sliding discharge is modeled numerically. It is shown that the microwave absorption coefficient can vary nonmonotonically with time (as observed in the majority of...

  • Numerical Investigation of a Microwave Discharge Driven by the H[sub 10]-Type Wave. Kaıryev, N. Zh.; Kulumbaev, É. B.; Lelevkin, V. M. // Plasma Physics Reports;May2000, Vol. 26 Issue 5, p456 

    A two-dimensional numerical model is proposed for studying a steady microwave discharge driven by the H[sub 10]-type wave. The parameters of a discharge in nitrogen at atmospheric pressure are calculated. The results obtained agree qualitatively with the experimental data. © 2000 MAIK...

  • Experimental investigations of the formation of a plasma mirror for high-frequency microwave beam... Meger, R.A.; Mathew, J.; Gregor, J.A.; Pechacek, R.E.; Fernsler, R.F.; Manheimer, W.; Robson, A.E. // Physics of Plasmas;Jun95, Vol. 2 Issue 6, p2532 

    Investigates the formation of a plasma mirror for high-frequency microwave beam steering. Far-field antenna pattern of microwaves reflected off the plasma sheet; Stationary condition of the critical surface during the current pulse; Plasma density measurements and optical emissions.

  • Planar microwave discharges with active control of plasma uniformity. Yasaka, Yasuyoshi; Koga, Kazuya; Ishii, Nobuo; Yamamoto, Tetsuya; Ando, Makoto; Takahashi, Masaharu // Physics of Plasmas;Mar2002, Vol. 9 Issue 3, p1029 

    Planar microwave discharges using a multi-slotted planar antenna are investigated. The enhancement of the microwave fields near the plasma resonance is observed in accordance with the theory of the resonant absorption. By operating the antenna with the azimuthally rotating fields, highly uniform...

  • Plasma buildup by short-pulse high-power microwaves. Bhattacharjee, Sudeep; Amemiya, Hiroshi; Yano, Yasushige // Journal of Applied Physics;4/1/2001, Vol. 89 Issue 7 

    The buildup of a plasma produced by short-pulse (0.05-1.2 μs), high-power (60-100 kW) microwaves is studied in a pressure range of 10 mTorr-10 Torr, by measurements of the temporal variation of the current and the optical intensity. The plasma is produced in a cylindrical tube and confined by...

  • Recent Progress in Understanding the Physics of Plasma-Filled, High-Power Microwave Sources. Nusinovich, G. S.; Bliokh, Y. P.; Abu-Elfadl, T. M.; Shkvarunets, A. G.; Goebel, D. M.; Carmel, Y.; Antonsen, T. M.; Granatstein, V. L. // AIP Conference Proceedings;2002, Vol. 625 Issue 1, p45 

    The use of plasmas for generating high-power microwaves is studied for more than 50 years. During the 1990's Plasma-Assisted Slow-wave Oscillators (PASOTRONs) were invented and actively developed at Hughes Research Lab (HRL). These devices have a number of unique and attractive features....


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics