TITLE

Ionic species responsible for the plasma anodization of silicon

AUTHOR(S)
Barlow, K. J.; Kiermasz, A.; Eccleston, W.; Moruzzi, J. L.
PUB. DATE
July 1988
SOURCE
Applied Physics Letters;7/4/1988, Vol. 53 Issue 1, p57
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Identification of the species that promotes the growth of silicon dioxide on silicon in a microwave oxygen plasma has been investigated. Comparison of ion analysis experiments using quadropole mass spectrometry and oxide growth experiments performed in the same system indicates a strong correlation between the oxide growth and the presence of O- ions in the plasma.
ACCESSION #
9827300

 

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