Selective amplification of self-resistively heated laser-direct-written tungsten lines

Gottsleben, O.; Stuke, M.
June 1988
Applied Physics Letters;6/27/1988, Vol. 52 Issue 26, p2230
Academic Journal
Laser-direct-write pyrolytic deposition of tungsten at 514.5 nm, out of the WF6 /H2 reduction system, was carried out on Al2O3 substrates between sputtered-on gold contact pads. Heat, generated by pulsed current sent through the laser-induced microdeposit, is used to amplify the microstructure by a conventional, however well localized, chemical vapor deposition process. In addition to tungsten, other more volatile materials can be deposited for amplification.


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