Laser direct writing of aluminum conductors

Cacouris, T.; Scelsi, G.; Shaw, P.; Scarmozzino, R.; Osgood, R. M.; Krchnavek, R. R.
May 1988
Applied Physics Letters;5/30/1988, Vol. 52 Issue 22, p1865
Academic Journal
We report, for the first time, the laser direct writing of high-conductivity aluminum interconnects from dimethylaluminum hydride (DMAlH). These lines were deposited from this metalorganic gas using a focused deep-ultraviolet laser beam, and the deposition process was studied as a function of several process parameters. Electrical measurements and Auger electron spectroscopy were used to characterize the quality of the laser-deposited films.


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