Gas source silicon molecular beam epitaxy using disilane

Hirayama, Hiroyuki; Tatsumi, Toru; Aizaki, Naoaki
May 1988
Applied Physics Letters;5/2/1988, Vol. 52 Issue 18, p1484
Academic Journal
In gas source silicon molecular beam epitaxy (MBE) using disilane, good crystal quality silicon epitaxial films were obtained at a temperature as low as 630 °C. In comparison with gas source Si-MBE using silane, a growth rate several times higher was attained. Boron doping in the gas source Si-MBE was also studied. Using HBO2 as the B-doping source, the doping level was controlled in the range of 1016–1018 cm-3 by the cell temperature. Because of the low growth temperature and the high growth rate, an abrupt doping profile was obtained.


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