TITLE

Laser desorption of polymer in a plasma reactor

AUTHOR(S)
Holber, W.; Gaines, D.; Yu, C. F.; Osgood, R. M.
PUB. DATE
April 1988
SOURCE
Applied Physics Letters;4/11/1988, Vol. 52 Issue 15, p1204
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Low-power ultraviolet (350 nm) laser light has been used to inhibit polymer formation on silicon in a plasma reactor containing CF4 /H2 reactants. The resultant increase in etch rate has been studied as a function of hydrogen partial pressure. Auger electron spectroscopy reveals a reduction in polymer formation in the area illuminated by the laser.
ACCESSION #
9826476

 

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