TITLE

Sputter deposition of YBa2Cu3O7-x films using a hemispherical target in a Hg vapor triode plasma

AUTHOR(S)
Wehner, G. K.; Kim, Y. H.; Kim, D. H.; Goldman, A. M.
PUB. DATE
April 1988
SOURCE
Applied Physics Letters;4/4/1988, Vol. 52 Issue 14, p1187
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
High-quality stoichiometric films of YBa2 Cu3 O7-x have been grown epitaxially on SrTiO3 substrates by sputtering from a stoichiometric target of hemispherical shape using a Hg vapor triode plasma. Films exhibited superconducting transitions of a width ΔT∼2.5 K, with zero resistance being achieved at 89 K. From both the x rays and the temperature dependence of the normal-state electrical resistance it can be inferred that the films contain an admixture of domains with either the c or a axes normal to the plane.
ACCESSION #
9826405

 

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