TITLE

Chemically etched micromirrors in silicon

AUTHOR(S)
Kendall, D. L.; de Guel, G. R.; Guel-Sandoval, S.; Garcia, E. J.; Allen, T. A.
PUB. DATE
March 1988
SOURCE
Applied Physics Letters;3/7/1988, Vol. 52 Issue 10, p836
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Purposely introduced pinholes can be processed so as to produce nearly spherical or paraboloidal depressions in (100) silicon by a two-step chemical etching procedure in KOH:water solutions. Regular arrays of f/1–f/10 specularly reflecting micromirrors can be fabricated.
ACCESSION #
9826158

 

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