TITLE

Y-Ba-Cu-O thin films prepared by a multilayer vacuum method

AUTHOR(S)
Qiu, C. X.; Shih, I.
PUB. DATE
February 1988
SOURCE
Applied Physics Letters;2/15/1988, Vol. 52 Issue 7, p587
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Polycrystalline Y-Ba-Cu-O thin films with a thickness of about 1 μm have been deposited on alumina substrates. The deposition was made by first sequentially evaporating Y/Ba/Cu layers followed by a heat treatment in an environment containing oxygen. The treated films were polycrystalline, and the electrical results showed an onset temperature of about 100 K and a zero-resistance temperature of 78 K for the films treated at 850 °C for 2 h in oxygen.
ACCESSION #
9825971

 

Related Articles

  • Cost and Reliability Dominate Users' Concerns. Studt, Tim // R&D Magazine;Oct99, Vol. 41 Issue 11, p26 

    Reveals the findings of a survey which determined the performance levels of vacuum equipment and the level of service provided by its suppliers. Significance of vacuum and thin-film technologies and equipment in the research and development environment; Applicability of thin film deposition.

  • Role of oxygen in defect-related breakdown in thin SiO2 films on Si (100). Hofmann, K.; Rubloff, G. W.; Young, D. R. // Journal of Applied Physics;5/1/1987, Vol. 61 Issue 9, p4584 

    Evaluates the influence of annealing in vacuum and in controlled low-pressure oxygen ambient on breakdown characteristics of thin SiO[sub2] films on Si (100). Details on the experiment; Results; Conclusions.

  • VACUUM EQUIPMENT.  // R&D Magazine;Sep2011 Supplement, Vol. 53, p83 

    A directory for suppliers of vacuum equipment together with suppliers of thin-film deposition and monitoring systems, cryogenic systems and semiconductor devices is presented.

  • Thin-film nanostructures: Substructural aspects. Ievlev, V. // Inorganic Materials;Feb2005 Supplement 2, Vol. 41, p71 

    A classification of thin-film nanostructures grown by vacuum deposition processes is presented. Particular attention is given to the formation of multioriented epitaxial nanostructures. Multioriented epitaxial growth is shown to depend on the interfacial energy. The size effect in the growth of...

  • The Mathematical Model of Conductance Measurement in Growing Thin Films. Sinkevičius, V. // Electronics & Electrical Engineering;2008, Issue 85, p17 

    The island stage, mono-atomic layers or self-organized derivatives are derivable producing nanostructures by vacuum technology. These layers are too thin for traditional measurements of their resistance or thickness. The non-invasive measurement was proposed for the measurement of these stages....

  • Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces. Dennison, J. R.; Wang, S.-K.; Dai, P.; Angot, T.; Taub, H.; Ehrlich, S. N. // Review of Scientific Instruments;Aug1992, Vol. 63 Issue 8, p3835 

    An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and...

  • Automation of Technological Equipment for Obtaining Multilayer Structures in an Ultrahigh Vacuum. Varnakov, S. N.; Lepeshev, A. A.; Ovchinnikov, S. G.; Parshin, A. S.; Korshunov, M. M.; Nevoral, P. // Instruments & Experimental Techniques;Nov/Dec2004, Vol. 47 Issue 6, p839 

    Automation of a complex of technological equipment for obtaining thin films and multilayer structures of semiconductor and magnetic materials in an ultrahigh vacuum is described. PC-based software and hardware units for controlling the ultrahigh vacuum system and automatically controlling the...

  • Thermostat for high temperature and transient characterization of thin film thermoelectric materials. Singh, Rajeev; Shakouri, Ali // Review of Scientific Instruments;Feb2009, Vol. 80 Issue 2, pN.PAG 

    We have designed and fabricated a vacuum-insulated thermostat capable of measuring the thermoelectric properties of thin films from room temperature to 850 K. High speed Seebeck voltage transients are resolved to 200 ns with 63 dB dynamic range in order to directly measure thermoelectric device...

  • Variation in Thickness of Copper Films Deposited at Various Distances and Angles Using the Thermionic Vacuum Arc. Akan, Tamer; Ekem, Naci // Turkish Journal of Physics;2003, Vol. 27 Issue 3, p219 

    Presents a study which measured the thickness of thin metallic films on each substrate using the thermionic vacuum arc (TVA) technique. Characteristics of TVA; Schematic presentation of the TVA; Results of the investigation of copper film thickness variations.

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics