Enhanced adhesion at oxide/oxide interfaces by ion beam stitching

Musket, R. G.; Thomas, I. M.; Wilder, J. G.
February 1988
Applied Physics Letters;2/1/1988, Vol. 52 Issue 5, p410
Academic Journal
The adhesion of antireflective, porous SiO2 coatings on fused silica substrates has been dramatically improved by irradiation with 200 keV helium ions. The approximately 220-nm-thick coatings consisted of layers of spherical, 20-nm-diam silica particles. Although the as-deposited coatings had only low adhesion, coatings irradiated with doses greater than 1014 He/cm2 passed both adhesive-tape and abrasive-resistance tests. Since these coatings are used on optical elements for 1064 nm high-power lasers, the effect of the helium irradiation on optical transmission was determined.


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