TITLE

Enhanced adhesion at oxide/oxide interfaces by ion beam stitching

AUTHOR(S)
Musket, R. G.; Thomas, I. M.; Wilder, J. G.
PUB. DATE
February 1988
SOURCE
Applied Physics Letters;2/1/1988, Vol. 52 Issue 5, p410
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
The adhesion of antireflective, porous SiO2 coatings on fused silica substrates has been dramatically improved by irradiation with 200 keV helium ions. The approximately 220-nm-thick coatings consisted of layers of spherical, 20-nm-diam silica particles. Although the as-deposited coatings had only low adhesion, coatings irradiated with doses greater than 1014 He/cm2 passed both adhesive-tape and abrasive-resistance tests. Since these coatings are used on optical elements for 1064 nm high-power lasers, the effect of the helium irradiation on optical transmission was determined.
ACCESSION #
9825819

 

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