Diffusion of reactive ion beam etched polymers

Tead, Stanley F.; Vanderlinde, William E.; Ruoff, Arthur L.; Kramer, Edward J.
January 1988
Applied Physics Letters;1/11/1988, Vol. 52 Issue 2, p101
Academic Journal
The diffusion of deuterated polystyrene (d-PS) in a polystyrene matrix was used to probe the damage to the polymer surface caused by reactive ion beam etching (RIBE). Diffusion was seen to be hindered in a d-PS film treated by RIBE, an immobilization apparently due to crosslinking of the surface monolayer of the polymer sample.


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