TITLE

Reactive ion beam etching of Y-Ba-Cu-O superconductors

AUTHOR(S)
Matsui, S.; Takado, N.; Tsuge, H.; Asakawa, K.
PUB. DATE
January 1988
SOURCE
Applied Physics Letters;1/4/88, Vol. 52 Issue 1, p69
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
It has been found that a reactive ion beam etching (RIBE) using Cl2 gas is useful for microfabrication of Y-Ba-Cu-O superconductors. The etching yield enhancement of Y-Ba-Cu-O is observed for Cl2 RIBE. The etching yield of Y-Ba-Cu-O at 400 V accelerating voltage, 2×10-3 Torr Cl2 pressure for Cl2 RIBE is 2, which is twice that for Ar ion beam etching. Y-Ba-Cu-O submicron patterns have been fabricated by focused ion beam lithography and Cl2 RIBE. Moreover, a Y-Ba-Cu-O superconducting line with a 4-μm linewidth has been fabricated by annealing an as-sputtered Y-Ba-Cu-O line pattern.
ACCESSION #
9825509

 

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