One-step two-level etching technique for monolithic integrated optics

Grande, W. J.; Braddock, W. D.; Shealy, J. R.; Tang, C. L.
December 1987
Applied Physics Letters;12/28/1987, Vol. 51 Issue 26, p2189
Academic Journal
We describe a one-step two-level etching technique for the batch fabrication of monolithically integrated optical circuits. The ability to fabricate high-quality laser devices with this process is demonstrated.


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