TITLE

Magnetron sputtering and laser patterning of high transition temperature Cu oxide films

AUTHOR(S)
Scheuermann, M.; Chi, C. C.; Tsuei, C. C.; Yee, D. S.; Cuomo, J. J.; Laibowitz, R. B.; Koch, R. H.; Braren, B.; Srinivasan, R.; Plechaty, M. M.
PUB. DATE
December 1987
SOURCE
Applied Physics Letters;12/7/1987, Vol. 51 Issue 23, p1951
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
High Tc Y-Ba-Cu-O films have been prepared by dc magnetron sputtering of metal alloy targets. To circumvent the negative ion effect, two alloy targets, YCu and BaCu, are sputtered in an argon atmosphere with an oxygen spray near the substrate. Films deposited on sapphire with onsets at 92 K and a 6° transition width (10–90%) have been achieved using this technique. These films have been successfully patterned with the technique of laser ablation.
ACCESSION #
9825168

 

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