TITLE

Focused ion beam induced fine patterns of organogold films

AUTHOR(S)
Ohmura, Y.; Shiokawa, T.; Toyoda, K.; Namba, S.
PUB. DATE
November 1987
SOURCE
Applied Physics Letters;11/9/1987, Vol. 51 Issue 19, p1500
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
It has been found that a relatively low-dose focused ion beam irradiation makes an organogold film insoluble to its solvents (e.g., trichloroethylene), resulting in submicron pattern formation. Ion beam induced, low conductivity as with resistivities of (4–4000) MΩ/[Laplacian_variant] has been observed for more than 1×1015 ions/cm2 dose for a 0.65-μm-thick film. However, by heat treatment at 300 °C after low-dose ion beam patterning, gold patterns with resistivity of 3×10-4 Ω cm, which is about 100 times the bulk gold value, are obtained.
ACCESSION #
9824858

 

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