Focused ion beam induced fine patterns of organogold films

Ohmura, Y.; Shiokawa, T.; Toyoda, K.; Namba, S.
November 1987
Applied Physics Letters;11/9/1987, Vol. 51 Issue 19, p1500
Academic Journal
It has been found that a relatively low-dose focused ion beam irradiation makes an organogold film insoluble to its solvents (e.g., trichloroethylene), resulting in submicron pattern formation. Ion beam induced, low conductivity as with resistivities of (4–4000) MΩ/[Laplacian_variant] has been observed for more than 1×1015 ions/cm2 dose for a 0.65-μm-thick film. However, by heat treatment at 300 °C after low-dose ion beam patterning, gold patterns with resistivity of 3×10-4 Ω cm, which is about 100 times the bulk gold value, are obtained.


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