TITLE

Integration of a resonant-tunneling structure with a metal-semiconductor field-effect transistor

AUTHOR(S)
Woodward, T. K.; McGill, T. C.; Chung, H. F.; Burnham, R. D.
PUB. DATE
November 1987
SOURCE
Applied Physics Letters;11/9/1987, Vol. 51 Issue 19, p1542
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We report experimental realization of a three-terminal negative differential resistance (NDR) device. The device consists of a GaAs-AlxGa1-xAs double-barrier tunneling heterostructure in series with a recessed-gate metal-semiconductor field-effect transistor on a semi-insulating substrate. Basic dc characteristics for three samples grown by metalorganic chemical vapor deposition are shown. All samples exhibit NDR at 77 K, with peak-to-valley current ratios between 2 and 7. Current densities at the peak of the NDR range from 0.5 to 380 A/cm2. The peak-to-valley current ratio and the voltage location of the NDR can be modulated with gate bias.
ACCESSION #
9824796

 

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