TITLE

Photon-controlled oxidation of silicon

AUTHOR(S)
Micheli, F.; Boyd, Ian W.
PUB. DATE
October 1987
SOURCE
Applied Physics Letters;10/12/1987, Vol. 51 Issue 15, p1149
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
A cw argon laser was used to oxidize crystalline silicon in dry oxygen. Under otherwise identical conditions, two visible wavelengths were used to identify possible nonthermal contributions to the reaction. With a simple technique to amplify small differences in the growth rate we have confirmed that the reaction is primarily thermally controlled and that there is a photonic enhancement to Si oxidation. A simulation has also provided some initial quantitative evaluation of the process.
ACCESSION #
9824487

 

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