Influence of conductor linewidth on short-circuit failure

Towner, Janet M.
June 1987
Applied Physics Letters;6/1/1987, Vol. 50 Issue 22, p1581
Academic Journal
A study was made on the influence of conductor linewidth on electromigration-induced short-circuit failure in layered TiW/Al-1% Cu conductors. Experimental results suggest that the median time to failure is constant for conductors wider than a critical dimension.


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