Large volume, high density rf inductively coupled plasma

Boswell, R. W.; Porteous, R. K.
April 1987
Applied Physics Letters;4/27/1987, Vol. 50 Issue 17, p1130
Academic Journal
Magnetized argon plasma columns with peak densities of greater than 1018 m-3, lengths of 2 m, and full width half-maximum diameters of 0.3 m have been created at pressures of 40 mPa (3×10-4 Torr) with input powers of 1.5 kW of 7 MHz rf.


Related Articles

  • Modeling of magnetically enhanced capacitively coupled plasma sources: Ar discharges. Kushner, Mark J. // Journal of Applied Physics;8/1/2003, Vol. 94 Issue 3, p1436 

    Magnetically enhanced capacitively coupled plasma sources use transverse static magnetic fields to modify the performance of low pressure radio frequency discharges. Magnetically enhanced reactive ion etching (MERLE) sources typically use magnetic fields of tens to hundreds of Gauss parallel to...

  • Nonequilibrium effects of diluent addition in a recombining argon plasma. Gordon, M. H.; Kruger, C. H. // Physics of Fluids B: Plasma Physics;Mar93, Vol. 5 Issue 3, p1014 

    Spectroscopic and calorimetric measurements have been made using a 50 kW radio frequency inductively coupled plasma torch operated at atmospheric pressure with maximum temperatures and electron densities near 8500 K and 3×1021 m-3, respectively. The plasma flowed through a water-cooled...

  • Argon gas puff implosion experiments and two-dimensional modeling. Deeney, C.; LePell, P. D.; Cochran, F. L.; Coulter, M. C.; Whitney, K. G.; Davis, J. // Physics of Fluids B: Plasma Physics;Mar93, Vol. 5 Issue 3, p992 

    The K-shell x ray yields from argon gas puff Z pinches are observed to increase from 3.5±1.0 kJ to 13±1.0 kJ when inwardly tilted nozzles are used on a 6 TW, 4 MA generator. This increase is associated with the elimination of the zipper effect and the achievement of higher density plasmas,...

  • Emission Efficiency and Amplification Properties of the Plasma of a Pulsed Discharge in Ar at Elevated Pressures. Dem’yanov, A. V.; Lo, D. // Plasma Physics Reports;May2001, Vol. 27 Issue 5, p440 

    The spontaneous emission efficiency of an Ar[sup *][sub 2] excimer and its amplification properties at a wavelength of 126 nm are studied using a numerical model of the weakly ionized plasma of a pulsed discharge in Ar at elevated pressures. It is shown that, under real experimental conditions,...

  • Multidipole confinement of argon and potassium plasmas. Bosch, Robert A.; Merlino, Robert L. // Review of Scientific Instruments;Dec1986, Vol. 57 Issue 12, p2940 

    Multidipole confinement of an argon discharge plasma and a potassium plasma produced by surface ionization was investigated. In both cases, a large volume of uniform density quiescent plasma was produced in the central region of low magnetic field strength. Measurements of electron and ion...

  • Bias formation in a pulsed radiofrequency argon discharge. Smith, H.B.; Charles, C. // Journal of Applied Physics;7/15/1997, Vol. 82 Issue 2, p561 

    Investigates the effects of pulsing on a low pressure, capacitively coupled, rf argon plasma with the use of a one dimensional (1D) particle-in-cell (PIC) computer simulation. Details of the computer simulation process; Theory presented; Electrode voltage; Ion and electron currents; Plasma...

  • Modeling argon inductively coupled plasmas: The electron energy distribution function and metastable kinetics. Kiehlbauch, Mark W.; Graves, David B. // Journal of Applied Physics;3/15/2002, Vol. 91 Issue 6, p3539 

    This article reports a simulation of argon inductively coupled plasma. Experimental measurements of the electron energy distribution function (EEDF) are fit to a power-law model and used to calculate electron impact rate coefficients in the simulation. Simulation results are compared to...

  • Electron temperature control with grid bias in inductively coupled argon plasma. Hong, J. I.; Seo, S. H. // Physics of Plasmas;Mar1999, Vol. 6 Issue 3, p1017 

    Studies electron temperature control with grid bias in inductively coupled argon plasma. Measurement of the electron energy distribution functions; Decrease of grid voltage.

  • Investigation of the gas pressure influence on patterned platinum etching characteristics using a high-density plasma. Delprat, S.; Chaker, M.; Margot, J. // Journal of Applied Physics;1/1/2001, Vol. 89 Issue 1, p29 

    A high-density surface-wave magnetized argon plasma operated in the very low pressure regime together with a rf biased system is used to study the pure physical etching characteristics of platinum thin films. It is shown that, for a given dc self-bias voltage, the platinum etch rate strongly...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics