Laser photoablation processes in organosilane thin films

Marinero, E. E.; Miller, R. D.
April 1987
Applied Physics Letters;4/20/1987, Vol. 50 Issue 16, p1041
Academic Journal
We report on the excimer laser-induced photoablation of some organosilane polymers utilizing quartz microbalance techniques to monitor the nature of the ablation phenomenon. A fluence threshold for the ablation process is identified beyond which the material removal rate depends nonlinearly on the adsorbed laser fluence. Below this threshold, photo-oxidation of the polymer is observed as evidenced by mass uptake of the film. Our results suggest that photoablation of the polysilanes studied is a result of a combination of thermal and photochemical processes.


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