TITLE

Laser photochemical etching of molybdenum and tungsten thin films by surface halogenation

AUTHOR(S)
Rothschild, M.; Sedlacek, J. H. C.; Ehrlich, D. J.
PUB. DATE
December 1986
SOURCE
Applied Physics Letters;12/1/1986, Vol. 49 Issue 22, p1554
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Laser direct-write etching of the refractory metals Mo and W has been developed using reactions in Cl2 and NF3 vapors. Rates and high spatial resolution are simultaneously optimized using a two-vapor halogenation/development sequence, based on surface modification. Local-area laser chlorination of the metal surface is used to predispose areas to subsequent bulk etching.
ACCESSION #
9821544

 

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