Mass spectroscopic identification of wavelength dependent UV laser photoablation fragments from polymethylmethacrylate

Estler, R. C.; Nogar, N. S.
November 1986
Applied Physics Letters;11/3/1986, Vol. 49 Issue 18, p1175
Academic Journal
Samples of polymethylmethacrylate have been irradiated with laser pulses of 266 nm wavelength along with the wavelengths generated via hydrogen-shifted stimulated Raman scattering. A quadrupole mass spectrometer monitors in real time the photoablation products produced during the irradiation. At wavelengths of 266 nm and above, the products are dominated by monomer, CO2, and CO. At wavelengths below 266 nm, a dramatic change of ablation products is observed, with methyl formate appearing as a major photochemical product.


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