Single crystal, epitaxial multilayers of AlAs, GaAs, and AlxGa1-xAs for use as optical interferometric elements

Gourley, P. L.; Drummond, T. J.
September 1986
Applied Physics Letters;9/1/1986, Vol. 49 Issue 9, p489
Academic Journal
We propose using single crystal multilayers of AlAs, GaAs, and AlxGa1-xAs for use as several different kinds of optical interference elements which include high reflectors, transmission filters, and Fabry–Perot cavities. We have grown many of these structures by molecular beam epitaxy and measured their optical characteristics. We find the characteristics of these structures to be very useful for a number of applications for integrated optical devices which we also propose.


Related Articles

  • Distance-Measuring and Interferometric Techniques. Adamy, Dave // Journal of Electronic Defense;Nov2002, Vol. 25 Issue 11, p62 

    Considers two ways to measure the distance from a receiving system to an emitter. Interferometric direction finding; Calculation for the distance based on known transmitted and received power levels.

  • Encoder measures motion through interferometry. Kinrot, Opher; Kinrot, Uri // Laser Focus World;Mar2000, Vol. 36 Issue 3, p121 

    Reports the application of encoders in interferometry. Features of coherent encoders; What is optical translation measurement (OTM); Applications of OTM.

  • Extension of the Controlled Sensitivity Range in Holographic Interferometry with a Lateral Shear. Lyalikov, A. M. // Optics & Spectroscopy;Sep2002, Vol. 93 Issue 3, p477 

    The possibility of controlling the measurement sensitivity in shearing interferometry with a small lateral shear is considered. A method based on recording several holographic interferograms with different magnitudes of lateral shear and with different carrier frequencies of holographic fringes...

  • Multiple-Exposure High-Sensitivity Holographic Interferometry for Studying Moving Objects. Lyalikov, A. M. // Technical Physics;Jun2002, Vol. 47 Issue 6, p708 

    A method for increasing the sensitivity of measurements through aberration compensation upon reconstruction of interferograms from two multiple-exposure holograms is proposed. At the early stage of object investigation, the holographic structures recorded at certain time instants are rerecorded...

  • Extending the surface force apparatus capabilities by using white light interferometry in reflection. Connor, Jason N.; Horn, Roger G. // Review of Scientific Instruments;Nov2003, Vol. 74 Issue 11, p4601 

    An important factor in the success of the surface force apparatus (SFA) in measuring interactions between surfaces over nanometer separations has been the optical interference technique used to measure the surface separation. Until recently, this technique has only been used when both of the...

  • Interferometric approaches each have advantages. Olszak, Artur G.; Schmit, Joanna; Heaton, Monteith G. // Laser Focus World;Sep2001, Vol. 37 Issue 9, p93 

    Deals with the efficiency of interferometry as a measurement technology for examining surface topography. Discussion on commonly used interferometric measurement techniques; Applications for interferometry; Background on interferometric objectives used in interference microscopy.

  • The impact of celestial pole offset modelling on VLBI UT1 intensive results. Malkin, Zinovy // Journal of Geodesy;Sep2011, Vol. 85 Issue 9, p617 

    Very Long Baseline Interferometry (VLBI) Intensive sessions are scheduled to provide operational Universal Time (UT1) determinations with low latency. UT1 estimates obtained from these observations heavily depend on the model of the celestial pole motion used during data processing. However,...

  • Frequency-comb interferometer measures absolute distance. Palmer, Jason // Laser Focus World;May2012, Vol. 48 Issue 5, p18 

    The article reports on a technique relative to interferometry devices that have made researchers to new means of measuring absolute distance with remarkable precision. This concept was brought forth by a team of researchers in the Netherlands which demonstrates distance precision which could be...

  • Depth-of-focus and the alternating phase-shift mask. Mack, Chris A. // Microlithography World;Nov2004, Vol. 13 Issue 4, p20 

    Evaluates the depth-of-focus (DOF) for an alternating phase-shifting mask (PSM) and shows its dependence on partial coherence. Discussion on the DOF of PSM; Illustration of the diffraction pattern spread out by a partially coherent source for an alternating PSM; Tip on evaluating the effect of...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics