Evidence for electron-induced x-ray emission in sputtering deposition

Hecq, M.
August 1986
Applied Physics Letters;8/25/1986, Vol. 49 Issue 8, p445
Academic Journal
A new technique is shown to study in situ the chemical composition of sputtered films. The method is based on the x-ray emission induced by the fast electrons of the sputtering discharge. The sputtering chamber is coupled with a vacuum x-ray spectrometer. As a demonstration of the method, the Co deposition is studied. The Co Lα x-ray line and the deposition rate (by means of a quartz microbalance) are recorded as a function of time. X-ray intensity increases quickly during the first minutes of the deposition, then levels off gradually while the deposition rate remains constant. It is speculated that a fraction of a monolayer should be detectable.


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