TITLE

Comment on ‘‘Physical processes in degradation of amorphous Si:H’’ [Appl. Phys. Lett. 48, 846 (1986)]

AUTHOR(S)
Guha, S.; Hack, M.
PUB. DATE
August 1986
SOURCE
Applied Physics Letters;8/25/1986, Vol. 49 Issue 8, p478
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Comments on the article 'Physical processes in degradation of amorphous Si:H,' by M. Stutzmann, W.B. Jackson and C.C. Tsai published in the 1984 issue of the journal 'Applied Physics Letters.' Occurrence of reversible light-induced effects of amorphous silicon alloys; Creation of metastable defects produced by electron-hole recombination; Reciprocity of time.
ACCESSION #
9820633

 

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