Superconducting NbNxCy thin films fabricated with a dual ion-beam sputtering method

Lin, L.-J.; Prober, D. E.
August 1986
Applied Physics Letters;8/18/1986, Vol. 49 Issue 7, p416
Academic Journal
We have fabricated refractory superconducting NbNxCy thin films on unheated Si substrates with a low-energy dual ion-beam sputtering technique. Films fabricated with this technique have predominantly B1 crystal structure with maximum Tc ∼13.2 K, resistivity of 80–150 μΩ cm and residual resistance ratio ∼1.0. The use of low ion-beam energies and the absence of substrate heating make this method well suited for producing NbNxCy films for superconducting microelectronic applications.


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