TITLE

Electron beam stimulated chemical vapor deposition of patterned tungsten films on Si(100)

AUTHOR(S)
Jackman, R. B.; Foord, J. S.
PUB. DATE
July 1986
SOURCE
Applied Physics Letters;7/28/1986, Vol. 49 Issue 4, p196
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Electron irradiation of WF6 films on Si has been studied using scanning Auger and electron microscopic techniques. In contrast to metal organics, electron stimulated decomposition of WF6 is found to result in formation of pure W deposits; patterned films are formed by scanning the focused electron beam. The morphology of the films is particulate and the manner in which this originates is discussed.
ACCESSION #
9820442

 

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