TITLE

Stress relaxation technique for thermally grown SiO2

AUTHOR(S)
Landsberger, L. M.; Tiller, W. A.
PUB. DATE
July 1986
SOURCE
Applied Physics Letters;7/21/1986, Vol. 49 Issue 3, p143
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
A corona discharge technique has been utilized at 800 °C to fully relax thermal oxides grown on Si wafers. In an experiment involving two oxidation steps, the corona-relaxed oxides are shown to be equivalent to ∼1200 °C thermally grown or thermally relaxed oxides, both with respect to index of refraction and oxygen diffusion coefficient. The activation energy for oxygen diffusion through a completely relaxed thermal oxide is found to be 0.8 eV.
ACCESSION #
9820385

 

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