TITLE

Metal deposition by electron beam exposure of an organometallic film

AUTHOR(S)
Craighead, H. G.; Schiavone, L. M.
PUB. DATE
June 1986
SOURCE
Applied Physics Letters;6/23/1986, Vol. 48 Issue 25, p1748
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We describe a method of metal deposition by electron beam exposure and pyrolysis of a gold containing organometallic polymer. Commercial gold containing solutions were used as negative electron beam resists with line dose sensitivities of about 0.2 μC/cm as developed in methylene chloride. We have demonstrated the formation of metal patterns on Si, GaAs, and polyimide with linewidths as small as 0.25 μm.
ACCESSION #
9820155

 

Related Articles

  • Growth of plasmonic gold nanostructures by electron beam induced deposition. Graells, S.; Alcubilla, R.; Badenes, G.; Quidant, R. // Applied Physics Letters;9/17/2007, Vol. 91 Issue 12, p121112 

    The authors report on the growth of organometallic dots for optical applications using electron beam induced gold deposition on a transparent substrate. The effects of the substrate material and the deposition parameters, such as beam current and water vapor pressure, on both the deposition rate...

  • Hydrogen beam stimulated low-temperature dissociation of organometallics—application for lowering the growth temperature in a metalorganic chemical vapor deposition process. Jagannathan, G. V.; Andrews, Merrill L.; Habig, Alec T. // Applied Physics Letters;5/14/1990, Vol. 56 Issue 20, p2019 

    A hydrogen atomic beam generated by microwave discharge was successfully used for dissociating trimethylaluminum (TMA) at the low substrate temperature of 300 °C. The results indicate that ‘‘H’’ atomic beam can stimulate the clean and complete dissociation of...

  • Self-assembled nanostructures of redox-functionalized terpyridines monitored by optical second-harmonic generation. Weidner, T.; Vor Der Brüggen, J.; Siemeling, U.; Träger, F. // Applied Physics B: Lasers & Optics;Aug2003, Vol. 77 Issue 1, p31 

    Examines the adsorption and self-organization of ferrocenyl-functionalized terpyridines on gold substrates. Optical second-harmonic generation; Film growth of the organometallic compounds; Ellipsometric measurements.

  • E-Beam Sources Provide High-Purity Films. Moore, Jim // R&D Magazine;Oct98, Vol. 40 Issue 11, p61 

    Points out that an electron-beam evaporation sources may be used for almost any coating process. Other uses of such technique; How electron-beam sources work; Things to be considered before choosing a particular type of electron beam gun.

  • Selective laser pyrolysis of metalorganics as a method of forming patterned thin-film superconductors. Mantese, J. V.; Catalan, A. B.; Mance, A. M.; Hamdi, A. H.; Micheli, A. L.; Sell, J. A.; Meyer, M. S. // Applied Physics Letters;10/3/1988, Vol. 53 Issue 14, p1335 

    Fine line superconductors of Y-Ba-Cu-O were formed on <100> SrTiO3 by the completely nonvacuum techniques of metalorganic deposition and selective laser pyrolysis. Lines 35 μm wide were written, using an Ar laser, in metal neodecanoates prior to pyrolysis. Regions of the metalorganics not...

  • Magnetic properties of ceramics from the pyrolysis of metallocene-based polymers doped with palladium. Thomas, K. R.; Ionescu, A.; Gwyther, J.; Manners, I.; Barnes, C. H. W.; Steiner, U.; Sivaniah, E. // Journal of Applied Physics;Apr2011, Vol. 109 Issue 7, p073904 

    Solution processing is a facile method to generate magnetic thin films. Polyferrocenylethylmethylsilane (PFEMS) was doped with palladium (II) acetylacetonate using two methods: sublimation of Pd(acac)2 to form Pd nanoparticles in the PFEMS films and direct mixing of Pd with the PFEMS polymer...

  • Si deposition by electron beam induced surface reaction. Matsui, Shinji; Mito, Masanobu // Applied Physics Letters;10/17/1988, Vol. 53 Issue 16, p1492 

    Si deposition has been achieved by electron beam induced surface reaction. An initial growth process for Si deposition using SiH2Cl2 source gas has been observed in situ by Auger electron spectroscopy. As a result, it became clear that the Si deposition growth rate is ∼0.3 Å/min at...

  • Catalytic growth rate enhancement of electron beam deposited iron films. Kunz, R. R.; Mayer, T. M. // Applied Physics Letters;4/13/1987, Vol. 50 Issue 15, p962 

    Submicron (<0.25 μm) wide lines of iron have been deposited by low-energy (0.5–3.0 keV) electron beam induced decomposition of iron pentacarbonyl. Selective area thermal decomposition of iron pentacarbonyl has also been demonstrated. It was found that under certain conditions, the...

  • UV Coating Myths. Cohen, Gary // Products Finishing;Jul2001, Vol. 65 Issue 10, p10s 

    Discusses some of the common myths and misconceptions along with the truth about ultraviolet and electron beam coating (UV/EB) technology. Information on the properties of UV/EB materials; Biological effects of exposure to UV light; Facts about the cost of equipment.

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics